Double patterning in VLSI: Multi patterning also called double patterning ,double patterning is introduced 32nm and lowers layers 10nm,7nm etc. Lithography pattern is a class of technologies for manufacturing IC's,developing for photolithography to enhance the feature of density and Optical microlithography (photolithography) is used for transferring the circuit patterns into silicon wafer. We are use illuminator uv light to shine light through this mask producing an image of the pattern through the lens system ,which eventually projected down into a photo resist coated silicon wafer using a protection system. Double patterning is a technique that decomposes a single layout into two masks in order to increase pitch size and improve depth of focus. Their resolution capabilities have fallen further and further behind the target minimum feature size per each advanced node...
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