vlsi companies in india

1.qualcomm

2.nividia

3.samsung

4.intel

5.google

6.AMD

7.MediaTek

8.Apple

9.NXP

10.Broadcom

11.western digital

12.synopsys

13.capgemini

14.Cadence

15.Micron Technology

16.xilinx

17.marvel technology

18.silicon labs

19.einfochips

20.moschip

21.tech mahindra

22.synapse

23.ust global

24.mirafra

25.HCL

26.ASM Technologies

27.adept chip services

28.cientra

29.insemi

30.altran

31.cypress semiconductors

32.wipro

33.truechip

34.smartsoc

35.digicomm

36.ACL Digital

37.leadsoc

38.tessolve

39.soctronics

40.IBM

41.sibridge technologies

42.excelmax

43.pozibility technology

44.bitsilica

45.niksperri technologies

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MOST IMPORTANT QUESTIONS FOR INTERVIEW

Q 1: What are the goals of Synthesis Q 2: What are the Tech inputs in PNR Q 3: What are the Design inputs in PNR Q 4: What are the types of cells in PNR Q 5: What are the types of IO pads Q 6: What is the purpose of IO pads Q 7: What is the use of Bound pad Q 8: How tool differentiate the stdcell, IOpad and Macro Q 9: What is difference between soft and hard macro Q 10: How tool calculate the rectilinear blocks area Q 11: Can we rotated the Macro in 90 or 270 degrees Q 12: Assume you have three types of block 7, 9, 12 Metal layers in 28 nm Technology which having more performance and why 13: Which inputs files having resistance and capacitance values Q 14: We have different RC corners im i right, why we have different RC corners Q 15: How multi cut via increase the performance and yeild. Q 16: In which stage normal flop converted into scan flop Q 17: what is difference between normal flop and scan flop Q 18: what is scan chain where we are used it

Double patterning ?

Double patterning in VLSI: Multi patterning also called double patterning ,double patterning is introduced 32nm and lowers layers 10nm,7nm etc. Lithography pattern is a class of technologies for manufacturing IC's,developing for photolithography to enhance the feature of density and Optical microlithography (photolithography) is used for transferring the circuit patterns into silicon wafer. We are use illuminator uv light to shine light through this mask producing an image of the pattern through the lens system ,which eventually projected down into a photo resist coated silicon wafer using a protection system. Double patterning is a technique that decomposes a single layout into two masks in order to increase pitch size and improve depth of focus. Their resolution capabilities have fallen further and further behind the target minimum feature size per each advanced nodes. their resolution capabilities have fallen further and further behind the targe

Synthesis Goals

SYNTHESIS CONCETPTS 1.what is synthesis 2.synthesis input files 3.goals of synthesis 4.synthesis process 5. .synthesis output files 6.Types of synthesis “ Synthesis transforms the RTL code of design modules into a gate-level netlist”. Important: This stage performs logic, area, power optimization, and scan insertion. Synthesis input files: 1. Timing library (.lib or .db) 2. Physical Library (lef, Milkyway) 3. SDC 4. RTL 5. DEF (For Physical aware Synthesis) 6. TLU+(Synopsys), Qrc(cadence) file 7. UPF Goal of Synthesis: 1. Logic optimization with good QoR 2. Scan insertion (DFT) 3. Netlist generation 4. Logical equivalence check should be preserved between the RTL and netlist INPUTS : 1. LIB: The timing library (.lib) contains information related to the timing, power, and area of standard cells. It also contains different PVT characterizations of cells. 2.

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